Invention Grant
- Patent Title: Hot spot defect detecting method and hot spot defect detecting system
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Application No.: US17121760Application Date: 2020-12-15
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Publication No.: US11900586B2Publication Date: 2024-02-13
- Inventor: Chien-Huei Chen , Pei-Chao Su , Xiaomeng Chen , Chan-Ming Chang , Shih-Yung Chen , Hung-Yi Chung , Kuang-Shing Chen , Li-Jou Lee , Yung-Cheng Lin , Wei-Chen Wu , Shih-Chang Wang , Chien-An Lin
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01N21/88 ; G01N21/95 ; G06N3/04 ; G06N3/08

Abstract:
A hot spot defect detecting method and a hot spot defect detecting system are provided. In the method, hot spots are extracted from a design of a semiconductor product to define a hot spot map comprising hot spot groups, wherein local patterns in a same context of the design yielding a same image content are defined as a same hot spot group. During runtime, defect images obtained by an inspection tool performing hot scans on a wafer manufactured with the design are acquired and the hot spot map is aligned to each defect image to locate the hot spot groups. The hot spot defects in each defect image are detected by dynamically mapping the hot spot groups located in each defect image to a plurality of threshold regions and respectively performing automatic thresholding on pixel values of the hot spots of each hot spot group in the corresponding threshold region.
Public/Granted literature
- US20210118125A1 HOT SPOT DEFECT DETECTING METHOD AND HOT SPOT DEFECT DETECTING SYSTEM Public/Granted day:2021-04-22
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