Invention Grant
- Patent Title: Substrate inspection system and method of use thereof
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Application No.: US18048164Application Date: 2022-10-20
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Publication No.: US11901202B2Publication Date: 2024-02-13
- Inventor: Youngjin Choi
- Applicant: JNK TECH
- Applicant Address: US CA San Jose
- Assignee: JNK TECH
- Current Assignee: JNK TECH
- Current Assignee Address: US CA San Jose
- Agency: Knobbe, Martens, Olsen & Bear, LLP
- Main IPC: G06K9/00
- IPC: G06K9/00 ; H01L21/67 ; H01L21/677 ; H01L21/68

Abstract:
A method of inspection and an inspection system for the film deposition process for substrates that includes glass and wafer are disclosed. The inspection system includes multiple camera modules positioned in a load lock unit of a process chamber, such as the camera modules that can capture images of the substrate in the load lock. The images are analyzed by a controller of the inspection system to determine the accuracy of robots in handling the substrate, calibration of the robots based on the analysis, and defects in the substrate caused during the handling and deposition process.
Public/Granted literature
- US20230187238A1 SUBSTRATE INSPECTION SYSTEM AND METHOD OF USE THEREOF Public/Granted day:2023-06-15
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