Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
-
Application No.: US18183966Application Date: 2023-03-15
-
Publication No.: US11901263B2Publication Date: 2024-02-13
- Inventor: Chung-Jung Wu , Chih-Hang Tung , Tung-Liang Shao , Sheng-Tsung Hsiao , Jen-Yu Wang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H01L23/46
- IPC: H01L23/46 ; H01L23/31 ; H01L23/42 ; H01L23/367 ; H01L21/52 ; H01L23/40 ; H01L23/473 ; H01L23/498 ; H01L23/00

Abstract:
A semiconductor device includes a package and a cooling cover. The package includes a first die having an active surface and a rear surface opposite to the active surface. The rear surface has a cooling region and a peripheral region enclosing the cooling region. The first die includes micro-trenches located in the cooling region of the rear surface. The cooling cover is stacked on the first die. The cooling cover includes a fluid inlet port and a fluid outlet port located over the cooling region and communicated with the micro-trenches.
Public/Granted literature
- US20230223318A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2023-07-13
Information query
IPC分类: