• Patent Title: Apparatus for irradiating a substrate
  • Application No.: US17923859
    Application Date: 2021-04-06
  • Publication No.: US11919289B2
    Publication Date: 2024-03-05
  • Inventor: Gunther Ackermann
  • Applicant: Gunther Ackermann
  • Applicant Address: DE Kolbermoor
  • Assignee: Gunther Ackermann
  • Current Assignee: Gunther Ackermann
  • Current Assignee Address: DE Kolbermoor
  • Priority: DE 2020002017.6 2020.05.08
  • International Application: PCT/DE2021/000062 2021.04.06
  • International Announcement: WO2021/223787A 2021.11.11
  • Date entered country: 2022-11-07
  • Main IPC: B41F23/04
  • IPC: B41F23/04 H05B3/00 H05K7/20
Apparatus for irradiating a substrate
Abstract:
The invention relates to an apparatus (1) for irradiating a substrate (2), which apparatus comprises a platform (4), which is straight or curved in relation to the longitudinal axis (3) of the platform (4), wherein one, two, three, four, five, six, seven, eight, nine, ten or more irradiation modules (6) and/or substrate supply air modules (36) and/or substrate exhaust air modules (37) are reversibly attachable directly or indirectly to the bottom side (8) of the platform (4) by sliding or inserting or mounting in one or more fixed or telescoping module attachment devices (10) provided on the bottom side (8) of the platform (4)—each extending from the front side (5) of the apparatus (1) and in the direction of the back side (9) of the apparatus (1).
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