Invention Grant
- Patent Title: Orientation degree distribution calculation method, orientation degree distribution analyzer, and orientation degree distribution analysis program
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Application No.: US17638434Application Date: 2020-08-11
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Publication No.: US11921061B2Publication Date: 2024-03-05
- Inventor: Rikio Soda , Kimihiro Ozaki
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP 19158868 2019.08.30
- International Application: PCT/JP2020/030586 2020.08.11
- International Announcement: WO2021/039379A 2021.03.04
- Date entered country: 2022-02-25
- Main IPC: G01N23/2055
- IPC: G01N23/2055

Abstract:
An orientation degree distribution analysis method includes steps of: inputting, to a main storage device, crystal structure information of an object to be measured, information on an intensity ratio of each diffraction peak and a crystal plane corresponding to each diffraction peak by X-ray diffraction measurement, information on a diffraction range and a diffraction sensitivity, and information on an intensity ratio of each diffraction peak of a randomly oriented sample; calculating an angle defined by an orientation plane and a crystal plane corresponding to a diffraction peak of interest from the information stored in the main storage device; calculating an existence ratio and storing the existence ratio in the main storage device; setting an orientation degree distribution function; and calculating an orientation degree distribution from the information of the inputting step and the information of the calculating step.
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