Invention Grant
- Patent Title: Imprint apparatus and product manufacturing method
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Application No.: US17544447Application Date: 2021-12-07
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Publication No.: US11921423B2Publication Date: 2024-03-05
- Inventor: Kenichi Kobayashi , Tatsuya Arakawa
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc., IP Division
- Priority: JP 18210917 2018.11.08 JP 18210925 2018.11.08
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
An imprint apparatus executes imprint processing of curing imprint material in a state in which the imprint material supplied onto a substrate and a mold are in contact with each other. The imprint apparatus includes a modulator configured to modulate incident light, a first optical system configured to guide first light from a first light source to the modulator, and second light from a second light source that has a wavelength different from that of the first light to the modulator, and a second optical system configured to guide modulated light modulated by the modulator to the substrate.
Public/Granted literature
- US20220091502A1 IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD Public/Granted day:2022-03-24
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