Invention Grant
- Patent Title: Photomask inspection system and method
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Application No.: US17715632Application Date: 2022-04-07
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Publication No.: US11922262B2Publication Date: 2024-03-05
- Inventor: Xueyu Liang
- Applicant: ChangXin Memory Technologies, Inc.
- Applicant Address: CN Hefei
- Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.
- Current Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.
- Current Assignee Address: CN Hefei
- Agency: Alston & Bird LLP
- Priority: CN 2111294569.X 2021.11.03
- Main IPC: G06K7/10
- IPC: G06K7/10 ; G06K7/14

Abstract:
The present disclosure provides a photomask inspection system and an inspection method. The mask inspection system includes: a mask thickness measuring device having sensor modules arranged side by side for measuring the thickness of the mask; a bar code reading device; a calibration device including a calibration rod and an electromagnet, the calibration rod includes a calibration stick and a calibration base, the electromagnet is set at the bottom of the calibration base, and the calibration device calibrates the barcode reading device.
Public/Granted literature
- US20230138028A1 PHOTOMASK INSPECTION SYSTEM AND METHOD Public/Granted day:2023-05-04
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