Invention Grant
- Patent Title: Method and system for defect detection
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Application No.: US18196900Application Date: 2023-05-12
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Publication No.: US11922617B2Publication Date: 2024-03-05
- Inventor: Annan Shu , Chao Yuan , Lili Han
- Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Applicant Address: CN Ningde
- Assignee: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Current Assignee: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Current Assignee Address: CN Ningde
- Agency: XSENSUS LLP
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06T7/33

Abstract:
The present application provides a method and system for defect detection. The method includes: acquiring a two-dimensional (2D) picture of an object to be detected; inputting the acquired 2D picture to a trained defect segmentation model to obtain a segmented 2D defect mask, where the defect segmentation model is trained based on a multi-level feature extraction instance segmentation network with intersection over union (IoU) thresholds being increased level by level, and the 2D defect mask includes information about a defect type, a defect size, and a defect location of a segmented defect region; and determining the segmented 2D defect mask based on a predefined defect rule to output a defect detection result.
Public/Granted literature
- US20230281785A1 METHOD AND SYSTEM FOR DEFECT DETECTION Public/Granted day:2023-09-07
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