Invention Grant
- Patent Title: Metal oxide and transistor including metal oxide
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Application No.: US17825209Application Date: 2022-05-26
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Publication No.: US11923423B2Publication Date: 2024-03-05
- Inventor: Shunpei Yamazaki
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP 18044786 2018.03.12 JP 18049535 2018.03.16 JP 18055807 2018.03.23 JP 18055943 2018.03.23
- Main IPC: H01L29/24
- IPC: H01L29/24 ; H01L29/786 ; H01L27/12 ; H01L29/06

Abstract:
A novel metal oxide is provided. One embodiment of the present invention is a crystalline metal oxide. The metal oxide includes a first layer and a second layer; the first layer has a wider bandgap than the second layer; the first layer and the second layer form a crystal lattice; and in the case where a carrier is excited in the metal oxide, the carrier is transferred through the second layer. Furthermore, the first layer contains an element M (M is one or more selected from Al, Ga, Y, and Sn) and Zn, and the second layer contains In.
Public/Granted literature
- US20220293739A1 METAL OXIDE AND TRANSISTOR INCLUDING METAL OXIDE Public/Granted day:2022-09-15
Information query
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