Invention Grant
- Patent Title: Surface emitting laser and method of manufacturing the same
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Application No.: US17260876Application Date: 2019-06-14
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Publication No.: US11923661B2Publication Date: 2024-03-05
- Inventor: Takayuki Kawasumi , Hideki Kimura , Kota Tokuda , Yoshiaki Watanabe
- Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: Sony Semiconductor Solutions Corporation
- Current Assignee: Sony Semiconductor Solutions Corporation
- Current Assignee Address: JP Kanagawa
- Agency: K&L Gates LLP
- Priority: JP 18136388 2018.07.20
- International Application: PCT/JP2019/023619 2019.06.14
- International Announcement: WO2020/017206A 2020.01.23
- Date entered country: 2021-01-15
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S5/227

Abstract:
A method of manufacturing a surface emitting laser according to an embodiment of the present disclosure includes the following two steps:
(1) a step of forming a semiconductor stacked structure on a substrate, the semiconductor stacked structure including an active layer, a first DBR layer of a first electrical conduction type, and a second DBR layer of a second electrical conduction type, the first DBR layer and the second DBR layer sandwiching the active layer, the second electrical conduction type being different from the first electrical conduction type; and
(2) a step of forming a mesa section at a portion on the second DBR layer side in the semiconductor stacked structure and then forming an annular diffusion region of the first electrical conduction type at an outer edge of the mesa section by impurity diffusion from a side surface of the mesa section, the mesa section including the second DBR layer, the mesa section not including the active layer.
(1) a step of forming a semiconductor stacked structure on a substrate, the semiconductor stacked structure including an active layer, a first DBR layer of a first electrical conduction type, and a second DBR layer of a second electrical conduction type, the first DBR layer and the second DBR layer sandwiching the active layer, the second electrical conduction type being different from the first electrical conduction type; and
(2) a step of forming a mesa section at a portion on the second DBR layer side in the semiconductor stacked structure and then forming an annular diffusion region of the first electrical conduction type at an outer edge of the mesa section by impurity diffusion from a side surface of the mesa section, the mesa section including the second DBR layer, the mesa section not including the active layer.
Public/Granted literature
- US20210328408A1 SURFACE EMITTING LASER AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2021-10-21
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