Invention Grant
- Patent Title: Channel structures having protruding portions in three-dimensional memory device and method for forming the same
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Application No.: US17117728Application Date: 2020-12-10
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Publication No.: US11925019B2Publication Date: 2024-03-05
- Inventor: Wanbo Geng , Lei Xue , Xiaoxin Liu , Tingting Gao
- Applicant: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
- Applicant Address: CN Wuhan
- Assignee: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
- Current Assignee: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
- Current Assignee Address: CN Wuhan
- Agency: BAYES PLLC
- Main IPC: H10B43/27
- IPC: H10B43/27 ; H10B43/10

Abstract:
A three-dimensional (3D) memory device includes a memory stack including conductive layers and dielectric layers interleaving the conductive layers, and a channel structure extending through the memory stack along a vertical direction. The channel structure has a plurality of protruding portions protruding along a lateral direction and facing the conductive layers, respectively, and a plurality of normal portions facing the dielectric layers, respectively, without protruding along the lateral direction. The channel structure includes a plurality of blocking structures in the protruding portions, respectively, and a plurality of storage structures in the protruding portions and over the plurality of blocking structures, respectively. A vertical dimension of each of the blocking structures is nominally the same as a vertical dimension of a respective one of the storage structures over the blocking structure.
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