Invention Grant
- Patent Title: Method and apparatus for cleaning process monitoring
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Application No.: US17308767Application Date: 2021-05-05
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Publication No.: US11926017B2Publication Date: 2024-03-12
- Inventor: Charlie Wang , Yu-Ping Tseng , Y. J. Chen , Wai-Ming Yeung , Chien-Shen Chen , Danny Kuo , Yu-Hsuan Hsieh , Hsuan Lo
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- The original application number of the division: US15940749 2018.03.29
- Main IPC: B08B3/14
- IPC: B08B3/14 ; B08B1/00 ; B08B3/00 ; B24B37/013 ; B24B53/017 ; C02F1/00 ; H01L21/02 ; H01L21/67

Abstract:
A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
Public/Granted literature
- US20210252668A1 METHOD AND APPARATUS FOR CLEANING PROCESS MONITORING Public/Granted day:2021-08-19
Information query
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