- Patent Title: Monomers, polymers and lithographic compositions comprising same
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Application No.: US16236883Application Date: 2018-12-31
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Publication No.: US11932713B2Publication Date: 2024-03-19
- Inventor: Emad Aqad , James F. Cameron , James W. Thackeray
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee Address: US MA Marlborough
- Agency: CANTOR COLBURN LLP
- Main IPC: G03F7/38
- IPC: G03F7/38 ; C07F11/00 ; C08F230/04 ; C09D133/04 ; C09D133/14 ; C09D143/00 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; G03F7/09 ; G03F7/11 ; G03F7/16 ; G03F7/20 ; G03F7/32
Abstract:
New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.
Public/Granted literature
- US20190202955A1 MONOMERS, POLYMERS AND LITHOGRAPHIC COMPOSITIONS COMPRISING SAME Public/Granted day:2019-07-04
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