Invention Grant
- Patent Title: Water-resistant gas barrier film, and method for producing water-resistant gas barrier film
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Application No.: US17176682Application Date: 2021-02-16
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Publication No.: US11932772B2Publication Date: 2024-03-19
- Inventor: Takeshi Nishikawa
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 18155306 2018.08.22
- Main IPC: B32B27/30
- IPC: B32B27/30 ; B32B27/08 ; B32B27/28 ; C08J5/18 ; C08J7/04 ; C08L29/04 ; C09D129/04 ; C09D179/02
Abstract:
A water-resistant gas barrier film is provided with a gas barrier layer at least disposed on a substrate film. The gas barrier layer is made from coating liquid comprising (a) at least one of carboxy group-modified polyvinyl alcohol and partially saponified polyvinyl alcohol, (b) completely saponified polyvinyl alcohol, and (c) polyethyleneimine.
Public/Granted literature
- US20210163777A1 WATER-RESISTANT GAS BARRIER FILM, AND METHOD FOR PRODUCING WATER-RESISTANT GAS BARRIER FILM Public/Granted day:2021-06-03
Information query
