Invention Grant
- Patent Title: Metalens with artificial focus pattern
-
Application No.: US17357076Application Date: 2021-06-24
-
Publication No.: US11933939B2Publication Date: 2024-03-19
- Inventor: Ya Sha Yi , Mao Ye
- Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
- Applicant Address: US MI Ann Arbor
- Assignee: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
- Current Assignee: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
- Current Assignee Address: US MI Ann Arbor
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: G02B1/00
- IPC: G02B1/00 ; G02B27/42

Abstract:
A metalens configured to shape the focus light into a flexibly designed pattern. The present teachings demonstrate the engineering of metalens with artificial focus pattern by creating line and ring-shaped focus as ‘drawing tools’. These metalens are fabricated through a single layer of silicon-based material through CMOS compatible nano fabrication process. The mechanism to generate artificial focus pattern can be applied to a plethora of future on-chip optical devices with applications ranging from beam engineering to next generation nano lithography.
Public/Granted literature
- US20210405257A1 METALENS WITH ARTIFICIAL FOCUS PATTERN Public/Granted day:2021-12-30
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B1/00 | 按制造材料区分的光学元件;用于光学元件的光学涂层 |