Invention Grant
- Patent Title: Resist composition and method of forming resist pattern
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Application No.: US17303253Application Date: 2021-05-25
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Publication No.: US11934099B2Publication Date: 2024-03-19
- Inventor: Yoichi Hori , Yosuke Suzuki
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP 20105392 2020.06.18
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/32

Abstract:
A resist composition containing a resin component (A1) having a constitutional unit (a01) and a constitutional unit (a02) derived from compounds each represented by General Formulae (a01-1) and (a02-1), a compound (B1) represented by General Formula (b1), and a compound represented by General Formula (d1-1) or a compound represented by General Formula (d1-2), in the formulae, Ct represents a tertiary carbon atom, a carbon atom at an α-position of Ct constitutes a carbon-carbon unsaturated bond, Wa02 represents an aromatic hydrocarbon group, and Rb1 represents hydrocarbon group, where a fluorine atom is not contained
Public/Granted literature
- US20210405531A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2021-12-30
Information query
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