Invention Grant
- Patent Title: Dielectric thin-film structure and electronic device including the same
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Application No.: US18154218Application Date: 2023-01-13
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Publication No.: US11935916B2Publication Date: 2024-03-19
- Inventor: Hyangsook Lee , Junghwa Kim , Eunha Lee , Jeonggyu Song , Jooho Lee , Myoungho Jeong
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20210017866 2021.02.08
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L21/02 ; H01L49/02

Abstract:
Provided are dielectric thin-film structures and electronic devices including the same. The dielectric thin-film structure includes a substrate, and a dielectric layer provided on the substrate. The dielectric layer including a tetragonal crystal structure, and crystal grains including a proportion of the crystal grains preferentially oriented such that at least one of a , , or direction of a crystal lattice is parallel to or forms an angle of less than 45 degrees an out-of-plane orientation.
Public/Granted literature
- US20230154973A1 DIELECTRIC THIN-FILM STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAME Public/Granted day:2023-05-18
Information query
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