Invention Grant
- Patent Title: Magnetic film and perpendicular magnetic recording medium
-
Application No.: US18177244Application Date: 2023-03-02
-
Publication No.: US11939663B2Publication Date: 2024-03-26
- Inventor: Manami Masuda , Masayoshi Shimizu , Yasuyuki Iwabuchi
- Applicant: JX Metals Corporation
- Applicant Address: JP Tokyo
- Assignee: JX Metals Corporation
- Current Assignee: JX Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: MARSHALL, GERSTEIN & BORUN LLP
- Priority: JP 18150675 2018.08.09
- The original application number of the division: US17266896
- Main IPC: G11B5/706
- IPC: G11B5/706 ; C04B35/01 ; C22C19/07 ; C23C14/08 ; C23C14/14 ; C23C14/34 ; G11B5/65 ; H01F1/10 ; H01F41/18 ; H01J37/34 ; C22C1/04 ; C22C32/00
Abstract:
Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
Public/Granted literature
- US20230227964A1 Magnetic Film and Perpendicular Magnetic Recording Medium Public/Granted day:2023-07-20
Information query
IPC分类:
