Invention Grant
- Patent Title: Reticle processing system
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Application No.: US17110514Application Date: 2020-12-03
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Publication No.: US11940724B2Publication Date: 2024-03-26
- Inventor: Sanjay Bhat , Vibhu Jindal
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: G03F1/20
- IPC: G03F1/20 ; G03F7/00 ; G03F7/09 ; G03F9/00

Abstract:
Provided herein are apparatus, systems and methods for processing reticle blanks. A reticle processing system includes a support assembly having a plate coupled to a frame, and a carrier base assembly supported on the support assembly. The carrier base assembly comprises a wall extending from a top surface of the carrier base and defining a containment region for a reticle.
Public/Granted literature
- US20210173295A1 RETICLE PROCESSING SYSTEM Public/Granted day:2021-06-10
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