Invention Grant
- Patent Title: Magnet arrangement for a plasma source for performing plasma treatments
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Application No.: US17416001Application Date: 2019-12-05
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Publication No.: US11942311B2Publication Date: 2024-03-26
- Inventor: Jörg Vetter
- Applicant: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Applicant Address: CH Pfäffikon
- Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Current Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Current Assignee Address: CH Pfäffikon
- Agency: GREENBLUM & BERNSTEIN, P.L.C.
- Priority: CH 619 2019.02.26
- International Application: PCT/EP2019/083898 2019.12.05
- International Announcement: WO2020/126531A 2020.06.25
- Date entered country: 2021-06-18
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C14/32 ; H01J37/34
Abstract:
In order to improve the etching depth and/or the etching homogeneity at a substrate, a plasma source with one or more single electrodes or one or more magnets is proposed. The magnet generates a magnetic field in the vicinity of the electrodes, which may be rear-side or front-side.
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