Invention Grant
- Patent Title: Wafer notch positioning detection
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Application No.: US18060981Application Date: 2022-12-02
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Publication No.: US11942348B2Publication Date: 2024-03-26
- Inventor: Kai-An Chuang , Kuang-Wei Hsueh , Shih-Huan Chen , Yung-Shu Kao
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Harrity & Harrity, LLP
- Main IPC: H01L21/68
- IPC: H01L21/68 ; G01B7/31

Abstract:
An optical system may include a light source to provide a beam of light. The optical system may include a reflector to receive and redirect the beam of light. The optical system may include a light gate having an opening to permit the beam of light, from the reflector, to travel through the opening. The optical system may include a light sensor to receive a portion of the beam of light after the beam of light travels through the opening, and convert the portion of the beam of light to a signal. The optical system may include a processing device to determine whether a notch of a wafer is in an allowable position based on the signal.
Public/Granted literature
- US20230096018A1 WAFER NOTCH POSITIONING DETECTION Public/Granted day:2023-03-30
Information query
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