Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US17874565Application Date: 2022-07-27
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Publication No.: US11942431B2Publication Date: 2024-03-26
- Inventor: Nobuyuki Momo , Keisuke Nakatsuka
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 19168887 2019.09.17
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L23/482 ; H01L23/522 ; H01L25/00 ; H01L25/065 ; H01L27/07 ; H01L27/08 ; H01L49/02

Abstract:
According to one embodiment, a semiconductor device includes a first semiconductor chip including a first metal pad and a second metal pad; and a second semiconductor chip including a third metal pad and a fourth metal pad, the third metal pad joined to the first metal pad, the fourth metal pad coupled to the second metal pad via a dielectric layer, wherein the second semiconductor chip is coupled to the first semiconductor chip via the first metal pad and the third metal pad.
Public/Granted literature
- US20220367371A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2022-11-17
Information query
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