Invention Grant
- Patent Title: Examination device
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Application No.: US17285557Application Date: 2019-10-07
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Publication No.: US11946858B2Publication Date: 2024-04-02
- Inventor: Yoshihiro Satou , Toshio Masuda , Hitoshi Matsuno , Kei Shibayama , Osamu Yoshimura , Yuichirou Iijima
- Applicant: HITACHI HIGH-TECH CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: MATTINGLY & MALUR, PC
- Priority: JP 18209474 2018.11.07
- International Application: PCT/JP2019/039433 2019.10.07
- International Announcement: WO2020/095594A 2020.05.14
- Date entered country: 2021-04-15
- Main IPC: G01N21/15
- IPC: G01N21/15 ; G01N21/95

Abstract:
The purpose of the present invention is to allow a clean airflow around a substrate to reliably move downward of the substrate in an examination device in which clean air is supplied to an inspection chamber. This examination device is provided with a rectifying plate (see FIG. 4A) which covers a part of the upper surface of a stage for mounting a substrate, and is disposed between a gas supply unit and the stage to block an airflow toward the substrate.
Public/Granted literature
- US20210404946A1 EXAMINATION DEVICE Public/Granted day:2021-12-30
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