Invention Grant
- Patent Title: Photonic semiconductor device and method of manufacture
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Application No.: US18312767Application Date: 2023-05-05
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Publication No.: US11947173B2Publication Date: 2024-04-02
- Inventor: Chung-Ming Weng , Chen-Hua Yu , Chung-Shi Liu , Hao-Yi Tsai , Cheng-Chieh Hsieh , Hung-Yi Kuo , Tsung-Yuan Yu , Hua-Kuei Lin , Che-Hsiang Hsu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: G02B6/43
- IPC: G02B6/43 ; G02B6/42

Abstract:
A package includes a photonic layer on a substrate, the photonic layer including a silicon waveguide coupled to a grating coupler; an interconnect structure over the photonic layer; an electronic die and a first dielectric layer over the interconnect structure, where the electronic die is connected to the interconnect structure; a first substrate bonded to the electronic die and the first dielectric layer; a socket attached to a top surface of the first substrate; and a fiber holder coupled to the first substrate through the socket, where the fiber holder includes a prism that re-orients an optical path of an optical signal.
Public/Granted literature
- US20230280558A1 Photonic Semiconductor Device and Method of Manufacture Public/Granted day:2023-09-07
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