Invention Grant
- Patent Title: Fabrication of low defectivity electrochromic devices
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Application No.: US15916142Application Date: 2018-03-08
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Publication No.: US11947232B2Publication Date: 2024-04-02
- Inventor: Sridhar Karthik Kailasam , Robin Friedman , Anshu A. Pradhan , Robert T. Rozbicki
- Applicant: View, Inc.
- Applicant Address: US CA Milpitas
- Assignee: View, Inc.
- Current Assignee: View, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Agent Brian D. Griedel
- Main IPC: G02F1/153
- IPC: G02F1/153 ; C09K9/00 ; G02F1/1523 ; G02F1/1524 ; G02F1/155 ; B05D5/06 ; B23K20/10 ; C03C17/34 ; C23C10/28 ; C23C14/02 ; C23C14/04 ; C23C14/08 ; C23C14/14 ; C23C14/18 ; C23C14/34 ; C23C14/56 ; C23C14/58

Abstract:
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.
Public/Granted literature
- US20180203320A1 FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES Public/Granted day:2018-07-19
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