Invention Grant
- Patent Title: Long sweep length DUV microlithographic beam scanning acousto-optical deflector and optics design
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Application No.: US17599356Application Date: 2020-01-20
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Publication No.: US11947241B2Publication Date: 2024-04-02
- Inventor: Andrzej Karawajczyk
- Applicant: Mycronic AB
- Applicant Address: SE Taby
- Assignee: Mycronic AB
- Current Assignee: Mycronic AB
- Current Assignee Address: SE Taby
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Ernest J. Beffel, Jr.
- International Application: PCT/EP2020/051218 2020.01.20
- International Announcement: WO2020/200530A 2020.10.08
- Date entered country: 2021-09-28
- Main IPC: G02F1/33
- IPC: G02F1/33 ; G03F7/00

Abstract:
The technology disclosed uses extreme beam shaping to increase the amount of energy projected through an AOD. First and second expanders and are described that are positioned before and after the AOD. In one implementation, the optical path shapes energy from a source, such as a Gaussian laser spot, deflects it, then reshapes it into a writing spot. In another implementation for image capture, rather than projection system, the disclosed optics reshape a reading spot from an imaged surface to a high-aspect ratio beam at an AOD exit, subject to deflection by the AOD. The optics reshape the radiation relayed by the high-aspect ratio beam through the AOD to a detector. Since light can travel in both directions through an optical system, the details described in terms of projecting a writing spot onto a radiation sensitive surface also apply to metrology sweeping a reading spot over an imaged surface.
Public/Granted literature
- US20220197108A1 LONG SWEEP LENGTH DUV MICROLITHOGRAPHIC BEAM SCANNING ACOUSTO-OPTICAL DEFLECTOR AND OPTICS DESIGN Public/Granted day:2022-06-23
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