Invention Grant
- Patent Title: Radiation source apparatus and method for using the same
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Application No.: US18312991Application Date: 2023-05-05
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Publication No.: US11948702B2Publication Date: 2024-04-02
- Inventor: Wei-Chung Tu , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: G21K1/06
- IPC: G21K1/06 ; G02B5/08 ; G02B5/10 ; G03F7/00 ; H05G2/00

Abstract:
A radiation source apparatus includes a vessel, a laser source, a collector, a horizontal obscuration bar, and a reflective mirror. The vessel has an exit aperture. The laser source is configured to emit a laser beam to excite a target material to form a plasma. The collector is disposed in the vessel and configured to collect a radiation emitted by the plasma and to reflect the collected radiation to the exit aperture of the vessel. The horizontal obscuration bar extends from a sidewall of the vessel at least to a position between the laser source and the exit aperture of the vessel. The reflective mirror is in the vessel and connected to the horizontal obscuration bar.
Public/Granted literature
- US20230274850A1 RADIATION SOURCE APPARATUS AND METHOD FOR USING THE SAME Public/Granted day:2023-08-31
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