Invention Grant
- Patent Title: Subtractive etch resolution implementing a functional thin metal resist
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Application No.: US16274091Application Date: 2019-02-12
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Publication No.: US11948848B2Publication Date: 2024-04-02
- Inventor: Jeremy Ecton , Oscar Ojeda , Leonel Arana , Suddhasattwa Nad , Robert May , Hiroki Tanaka , Brandon C. Marin
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L23/31
- IPC: H01L23/31 ; H01L21/283 ; H01L23/498 ; H05K1/02 ; H05K3/06

Abstract:
Embodiments disclosed herein include electronic packages and methods of forming such packages. In an embodiment, the electronic package comprises a substrate and a conductive feature over the substrate. In an embodiment, a metallic mask is positioned over the conductive feature. In an embodiment, the metallic mask extends beyond a first edge of the conductive feature and a second edge of the conductive feature.
Public/Granted literature
- US20200258800A1 SUBTRACTIVE ETCH RESOLUTION IMPLEMENTING A FUNCTIONAL THIN METAL RESIST Public/Granted day:2020-08-13
Information query
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