Invention Grant
- Patent Title: Gate fringing effect based channel formation for semiconductor device
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Application No.: US17670975Application Date: 2022-02-14
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Publication No.: US11950412B2Publication Date: 2024-04-02
- Inventor: Youseok Suh , Sung-Yong Chung , Ya-Fen Lin , Yi-Ching Jean Wu
- Applicant: LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Applicant Address: IE Dublin
- Assignee: Longitude Flash Memory Solutions LTD.
- Current Assignee: Longitude Flash Memory Solutions LTD.
- Current Assignee Address: IE Dublin
- Agency: Kunzler Bean & Adamson
- The original application number of the division: US12368023 2009.02.09
- Main IPC: H01L29/788
- IPC: H01L29/788 ; H01L21/28 ; H01L29/423 ; H01L29/66 ; H01L29/792 ; H10B41/30 ; H10B41/35 ; H10B43/30 ; H10B43/35

Abstract:
A memory device is described. Generally, the device includes a string of memory transistors, a source select transistor coupled to a first end of the string of memory transistor and a drain select transistor coupled to a second end of the string of memory transistor. Each memory transistor includes a gate electrode formed adjacent to a charge trapping layer and there is neither a source nor a drain junction between adjacent pairs of memory transistors or between the memory transistors and source select transistor or drain select transistor. In one embodiment, the memory transistors are spaced apart from adjacent memory transistors and the source select transistor and drain select transistor, such that channels are formed therebetween based on a gate fringing effect associated with the memory transistors. Other embodiments are also described.
Public/Granted literature
- US20220173116A1 GATE FRINGING EFFECT BASED CHANNEL FORMATION FOR SEMICONDUCTOR DEVICE Public/Granted day:2022-06-02
Information query
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