Invention Grant
- Patent Title: Electrical contacts for low dimensional materials
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Application No.: US17044504Application Date: 2018-12-06
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Publication No.: US11950515B2Publication Date: 2024-04-02
- Inventor: Samuel Lara-Avila , Sergey Kubatkin , Hans He
- Applicant: GRAPHENSIC AB
- Applicant Address: SE Stockholm
- Assignee: GRAPHENSIC AB
- Current Assignee: GRAPHENSIC AB
- Current Assignee Address: SE Stockholm
- Agency: RMCK Law Group, PLC
- Priority: SE 503664 2018.04.03
- International Application: PCT/SE2018/051258 2018.12.06
- International Announcement: WO2019/194713A 2019.10.10
- Date entered country: 2020-10-01
- Main IPC: H01L43/04
- IPC: H01L43/04 ; C01B32/194 ; G01R33/07 ; H10N52/01 ; H10N52/80 ; B82Y15/00 ; B82Y40/00 ; H10N52/00

Abstract:
The present invention relates to a method for connecting an electrical contact to a nanomaterial carried by a substrate. At least one layer of soluble lithography resist is provided on the nanomaterial. An opening in the at least one layer of resist exposes a surface portion of the nanomaterial. At least a portion of the exposed surface portion of the nanomaterial is removed to thereby expose the underlying substrate and an edge of the nanomaterial. A metal is deposited on at least the edge of the nanomaterial and the exposed substrate such that the metal forms an electrical contact with the nanomaterial. Removing at least a portion of the soluble lithography resist from the nanomaterial such that at least a portion of the two-dimensional material is exposed.
Public/Granted literature
- US20210043830A1 ELECTRICAL CONTACTS FOR LOW DIMENSIONAL MATERIALS Public/Granted day:2021-02-11
Information query
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