Invention Grant
- Patent Title: Mask apparatus
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Application No.: US17174766Application Date: 2021-02-12
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Publication No.: US11951337B2Publication Date: 2024-04-09
- Inventor: Chiyoung Choi , Taeun Heo , Hojung Kim , Wansu Youn , Sangkyun Baek , Yeongcheol Mun , Keonwang Lee
- Applicant: LG Electronics Inc.
- Applicant Address: KR Seoul
- Assignee: LG ELECTRONICS INC.
- Current Assignee: LG ELECTRONICS INC.
- Current Assignee Address: KR Seoul
- Agency: Fish & Richardson P.C.
- Priority: KR 20200080437 2020.06.30
- Main IPC: A62B18/08
- IPC: A62B18/08 ; A61B5/08 ; A62B18/00 ; A62B18/02 ; A62B5/00 ; A62B7/10 ; A62B23/02 ; C08J5/18 ; C08J9/00

Abstract:
A mask apparatus including a mask body that defines a communication hole, a sensor mounting portion that extends from a front surface of the mask body, that surrounds the communication hole, and that defines an installation space therein, a seal coupled to a rear surface of the mask body and configured to define a breathing space between the mask body and a user, a pressure sensor accommodated in the installation space and configured to sense air pressure inside the breathing space that is in communication with the communication hole, and a film disposed in the installation space and configured to restrict permeation of moisture from the breathing space into the installation space through the communication hole.
Public/Granted literature
- US20210402223A1 MASK APPARATUS Public/Granted day:2021-12-30
Information query
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