Invention Grant
- Patent Title: Damage prevention during wafer edge trimming
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Application No.: US17317977Application Date: 2021-05-12
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Publication No.: US11951569B2Publication Date: 2024-04-09
- Inventor: Kuo-Ming Wu , Yung-Lung Lin , Hau-Yi Hsiao , Sheng-Chau Chen , Cheng-Yuan Tsai
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B23K26/035 ; B23K26/062 ; B23K26/361 ; H01L21/66

Abstract:
In some embodiments, the present disclosure relates to a wafer edge trimming apparatus that includes a processing chamber defined by chamber housing. Within the processing chamber is a wafer chuck configured to hold onto a wafer structure. Further, a blade is arranged near an edge of the wafer chuck and configured to remove an edge potion of the wafer structure and to define a new sidewall of the wafer structure. A laser sensor apparatus is configured to direct a laser beam directed toward a top surface of the wafer chuck. The laser sensor apparatus is configured to measure a parameter of an analysis area of the wafer structure. Control circuitry is to the laser sensor apparatus and the blade. The control circuitry is configured to start a damage prevention process when the parameter deviates from a predetermined threshold value by at least a predetermined shift value.
Public/Granted literature
- US20220362887A1 DAMAGE PREVENTION DURING WAFER EDGE TRIMMING Public/Granted day:2022-11-17
Information query
IPC分类: