- Patent Title: Semiconductor processing chambers and methods for cleaning the same
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Application No.: US16936110Application Date: 2020-07-22
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Publication No.: US11952660B2Publication Date: 2024-04-09
- Inventor: Nitin Pathak , Yuxing Zhang , Tuan A. Nguyen , Kalyanjit Ghosh , Amit Bansal , Juan Carlos Rocha-Alvarez
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/458 ; C23C16/52 ; H01J37/32

Abstract:
A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.
Public/Granted literature
- US20210032747A1 SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME Public/Granted day:2021-02-04
Information query
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