Invention Grant
- Patent Title: Automatic analysis device
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Application No.: US17285972Application Date: 2019-10-09
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Publication No.: US11953508B2Publication Date: 2024-04-09
- Inventor: Sunao Funakoshi , Takenori Okusa , Nobuyuki Isoshima , Koki Yokoyama
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP 18246148 2018.12.27
- International Application: PCT/JP2019/039745 2019.10.09
- International Announcement: WO2020/137081A 2020.07.02
- Date entered country: 2021-04-16
- Main IPC: G01N35/00
- IPC: G01N35/00 ; B01L3/00 ; B01L7/00

Abstract:
An automatic analysis device includes a processing unit 3 which performs the treatment on a specimen before analysis of the specimen, supply equipment which supplies a reagent to a reaction vessel 11 disposed in the processing unit 3, a liquid temperature adjusting unit 1 which adjusts a temperature of the reagent supplied to the reaction vessel 11 by the supply equipment, a control unit 201, and a first temperature detection unit 4 which detects at least one temperature of a temperature of the air within the processing unit 3 and a temperature of the reagent supplied to the reaction vessel 11, in which the liquid temperature adjusting unit 1 and the control unit 201 execute temperature adjustment of the reagent based on a first temperature detected by the first temperature detection unit 4.
Public/Granted literature
- US20210382078A1 Automatic Analysis Device Public/Granted day:2021-12-09
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