Invention Grant
- Patent Title: Grating coupler and method of manufacturing the same
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Application No.: US17446669Application Date: 2021-09-01
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Publication No.: US11953725B2Publication Date: 2024-04-09
- Inventor: Feng-Wei Kuo , Chewn-Pu Jou , Hsing-Kuo Hsia
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner. L.L.P
- Main IPC: G02B6/12
- IPC: G02B6/12 ; G02B6/124 ; G02B6/132 ; H01S5/026

Abstract:
A device includes a dielectric layer, a plurality of grating structures, and a dielectric material between the plurality of grating structures and on top of the plurality of grating structures. The grating structures are arranged on the dielectric layer and separated from each other, the plurality of grating structures each having a bottom portion and top portion, the top portion having a first width and the bottom portion having a second width, the second width being larger than the first width.
Public/Granted literature
- US20220404552A1 GRATING COUPLER AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-12-22
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