- Patent Title: Method, substrate and system for estimating stress in a substrate
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Application No.: US17423818Application Date: 2019-11-05
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Publication No.: US11953837B2Publication Date: 2024-04-09
- Inventor: Thomas Poiesz , Michel Ben Isel Habets , Abraham Alexander Soethoudt , Herman Marquart
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP 152455.2 2019.01.18
- International Application: PCT/EP2019/080270 2019.11.05
- International Announcement: WO2020/147992A 2020.07.23
- Date entered country: 2021-07-16
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
The present invention provides a testing substrate (W) for estimating stress in production substrates due to a substrate support, said testing substrate having a support surface (SS) divided into predefined portions, wherein the predefined portions comprise at least one first portion (1) having a first coefficient of friction being substantially uniform across the at least one first portion, and at least one second portion (2) having a second coefficient of friction being substantially uniform across the at least one second portion, wherein the second coefficient of friction is different to the first coefficient of friction. The present invention also provides a method for estimating stress in a substrate due to a substrate support and a system for making such an estimation.
Public/Granted literature
- US20220113640A1 METHOD, SUBSTRATE AND SYSTEM FOR ESTIMATING STRESS IN A SUBSTRATE Public/Granted day:2022-04-14
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