Invention Grant
- Patent Title: Thermosensitive deformation apparatus
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Application No.: US13375167Application Date: 2010-05-21
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Publication No.: US11955205B2Publication Date: 2024-04-09
- Inventor: Yoshimitsu Oda , Masaaki Ishio
- Applicant: Yoshimitsu Oda , Masaaki Ishio
- Applicant Address: JP Suita
- Assignee: PROTERIAL, LTD.
- Current Assignee: PROTERIAL, LTD.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JP 09140040 2009.06.11
- International Application: PCT/JP2010/058637 2010.05.21
- International Announcement: WO2010/143515A 2010.12.16
- Date entered country: 2011-11-29
- Main IPC: G12B1/02
- IPC: G12B1/02 ; B32B15/01 ; C22C38/08 ; C22C38/12 ; C22C38/40

Abstract:
A high-temperature bimetal capable of being inhibited from considerably shifting from an original position when the temperature has fallen to an ordinary temperature is provided. This high-temperature bimetal (1) includes a high thermal expansion layer (2) made of austenitic stainless steel and a low thermal expansion layer (3) made of a thermosensitive magnetic metal having a Curie point and bonded to the high thermal expansion layer. The high-temperature bimetal is employed over both a high temperature range of not less than the Curie point and a low temperature range of less than the Curie point, while an upper limit of operating temperatures in the high temperature range of not less than the Curie point is at least 500° C.
Public/Granted literature
- US20120077056A1 HIGH-TEMPERATURE BIMETAL Public/Granted day:2012-03-29
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