Invention Grant
- Patent Title: Band-pass filter
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Application No.: US17556559Application Date: 2021-12-20
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Publication No.: US11955681B2Publication Date: 2024-04-09
- Inventor: Honoka Atsuchi , Yuta Ashida , Longfei Yi , Yoshinori Matsumaru , Shuhei Sawaguchi , Masahiro Tatematsu , Shigemitsu Tomaki
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP 20215674 2020.12.24
- Main IPC: H01P1/20
- IPC: H01P1/20

Abstract:
A band-pass filter includes a first input/output port, a second input/output port, a plurality of resonators, and a multilayer stack. The multilayer stack includes a plurality of stacked dielectric layers. Each of the resonators is an open-ended resonator formed of a conductor line in the multilayer stack. Each of the resonators includes a resonator conductor portion including a first line part and a second line part located away from each other in a direction orthogonal to a stacking direction of the plurality of dielectric layers, and a third line part connecting the first line part and the second line part. The first to third line parts extend to surround a space between the first line part and the second line part.
Public/Granted literature
- US20220209380A1 BAND-PASS FILTER Public/Granted day:2022-06-30
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