- Patent Title: Semiconductor storage device and manufacturing method of the same
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Application No.: US17198410Application Date: 2021-03-11
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Publication No.: US11956956B2Publication Date: 2024-04-09
- Inventor: Takeshi Narukage
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 20123481 2020.07.20
- Main IPC: H10B43/27
- IPC: H10B43/27 ; H10B43/10 ; H10B43/40

Abstract:
According to one embodiment, a semiconductor storage device is provided which includes a stacked body, a first pillar portion, a first separating portion, and a first supporting post. In the stacked body, a plurality of insulating layers and a plurality of electrically conductive layers are stacked alternately one on another. The stacked body is provided on a predetermined electrically conductive film. The first pillar portion includes a plurality of memory cells, and penetrates through the stacked body in a stacking direction of the stacked body. The first separating portion separates the stacked body into a plurality of blocks. The first supporting post extends locally within the stacked body from an upper surface of the predetermined electrically conductive film in the stacking direction.
Public/Granted literature
- US20220020765A1 SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2022-01-20
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