Invention Grant
- Patent Title: Systems and methods for fabrication of superconducting integrated circuits
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Application No.: US17321819Application Date: 2021-05-17
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Publication No.: US11957065B2Publication Date: 2024-04-09
- Inventor: Shuiyuan Huang , Byong H. Oh , Douglas P. Stadtler , Edward G. Sterpka , Paul I. Bunyk , Jed D. Whittaker , Fabio Altomare , Richard G. Harris , Colin C. Enderud , Loren J. Swenson , Nicolas C. Ladizinsky , Jason J. Yao , Eric G. Ladizinsky
- Applicant: D-WAVE SYSTEMS INC.
- Applicant Address: CA Burnaby
- Assignee: 1372934 B.C. LTD.
- Current Assignee: 1372934 B.C. LTD.
- Current Assignee Address: CA Burnaby
- Agency: Cozen O'Connor
- Main IPC: H10N60/01
- IPC: H10N60/01 ; H01L21/768 ; H01L23/522 ; H01L23/528 ; H01L23/532 ; H10N60/85 ; H10N69/00

Abstract:
Various techniques and apparatus permit fabrication of superconductive circuits. A superconducting integrated circuit comprising a superconducting stud via, a kinetic inductor, and a capacitor may be formed. Forming a superconducting stud via in a superconducting integrated circuit may include masking with a hard mask and masking with a soft mask. Forming a superconducting stud via in a superconducting integrated circuit may include depositing a dielectric etch stop layer. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by an electrical vernier. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by a chain of electrical verniers and a Wheatstone bridge. A superconducting integrated circuit with three or more metal layers may include an enclosed, matched, on-chip transmission line. A metal wiring layer in a superconducting integrated circuit may be encapsulated.
Public/Granted literature
- US20210384406A1 SYSTEMS AND METHODS FOR FABRICATION OF SUPERCONDUCTING INTEGRATED CIRCUITS Public/Granted day:2021-12-09
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