Invention Grant
- Patent Title: Combined lenses-based apparatus for line laser uniformity generation
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Application No.: US17534470Application Date: 2021-11-24
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Publication No.: US11960097B2Publication Date: 2024-04-16
- Inventor: Yanlin Woo
- Applicant: ELITE OPTOELECTRONICS CO., LTD
- Applicant Address: CN Shaanxi
- Assignee: ELITE OPTOELECTRONICS CO., LTD
- Current Assignee: ELITE OPTOELECTRONICS CO., LTD
- Current Assignee Address: CN Shaanxi
- Priority: CN 1920805160.1 2019.05.30
- Main IPC: G02B3/06
- IPC: G02B3/06 ; G02B3/04 ; G02B27/09

Abstract:
Disclosed is a combined lenses-based apparatus for line laser uniformity generation. The apparatus includes a laser diode, and an aspheric focusing lens and combined lenses that are arranged behind the laser diode sequentially. The combined lenses include a cylindrical lens and a plano-convex cylindrical lens. The cylindrical lens and the plano-convex cylindrical lens are arranged on an optical path sequentially. One end surface of the aspheric focusing lens is an aspheric surface. Light emitted by the laser diode is focused by passing though the aspheric focusing lens, and the combined lenses are able to disperse a focused beam into uniform line laser.
Public/Granted literature
- US20220082844A1 COMBINED LENSES-BASED APPARATUS FOR LINE LASER UNIFORMITY GENERATION Public/Granted day:2022-03-17
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