Invention Grant
- Patent Title: Glass substrate having through hole and hollowed-out portion and method for producing the same
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Application No.: US17120717Application Date: 2020-12-14
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Publication No.: US11964344B2Publication Date: 2024-04-23
- Inventor: Mamoru Isobe , Kohei Horiuchi
- Applicant: AGC Inc.
- Applicant Address: JP Tokyo
- Assignee: AGC Inc.
- Current Assignee: AGC Inc.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 19237339 2019.12.26
- Main IPC: B23K26/384
- IPC: B23K26/384 ; B23K26/0622 ; B23K26/402 ; B23K26/50 ; B23K103/00 ; C03C15/00

Abstract:
A glass substrate for a semiconductor package includes a first principal surface, a second principal surface, at least one hollowed-out portion, and at least one through hole formed in a surrounding of the at least one hollowed-out portion, wherein in a section of the at least one hollowed-out portion taken in a direction perpendicular to the first principal surface, a minimum diameter of the at least one hollowed-out portion is smaller than an opening diameter of the at least one hollowed-out portion at each of the first principal surface and the second principal surface.
Public/Granted literature
- US20210197320A1 GLASS SUBSTRATE HAVING THROUGH HOLE AND HOLLOWED-OUT PORTION AND METHOD FOR PRODUCING THE SAME Public/Granted day:2021-07-01
Information query
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