Invention Grant
- Patent Title: Sealed force sensor with etch stop layer
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Application No.: US17860941Application Date: 2022-07-08
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Publication No.: US11965787B2Publication Date: 2024-04-23
- Inventor: Julius Minglin Tsai , Ryan Diestelhorst , Dan Benjamin
- Applicant: NextInput, Inc.
- Applicant Address: US CA San Jose
- Assignee: NextInput, Inc.
- Current Assignee: NextInput, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: G01L1/00
- IPC: G01L1/00 ; B81B3/00 ; B81C1/00 ; G01L1/18 ; G01L1/26

Abstract:
An example microelectromechanical system (MEMS) force sensor is described herein. The MEMS force sensor can include a sensor die configured to receive an applied force. The sensor die can include a first substrate and a second substrate, where a cavity is formed in the first substrate, and where at least a portion of the second substrate defines a deformable membrane. The MEMS force sensor can also include an etch stop layer arranged between the first substrate and the second substrate, and a sensing element arranged on a surface of the second substrate. The sensing element can be configured to convert a strain on the surface of the membrane substrate to an analog electrical signal that is proportional to the strain.
Public/Granted literature
- US20230016531A1 SEALED FORCE SENSOR WITH ETCH STOP LAYER Public/Granted day:2023-01-19
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