Invention Grant
- Patent Title: Immersion exposure tool
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Application No.: US17248394Application Date: 2021-01-22
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Publication No.: US11966165B2Publication Date: 2024-04-23
- Inventor: Yung-Yao Lee
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Harrity & Harrity, LLP
- Main IPC: C23C16/34
- IPC: C23C16/34 ; C09D1/00 ; C09D5/00 ; C23C14/06 ; C23C14/08 ; C23C16/40 ; G03F7/00

Abstract:
A bottom lens for an immersion exposure tool includes a hydrophobic coating on the sidewalls of the bottom lens. A bottom portion of the bottom lens is not coated with the hydrophobic coating to maintain the optical performance of the bottom lens and to not distort a pattern that is to be transferred to a substrate. The hydrophobic coating may reduce the thermal instability of the bottom lens. This may reduce overlay variation during operation of the immersion exposure tool, which may increase manufacturing yield, decrease device failures, and/or decrease rework and repairs.
Public/Granted literature
- US20220236646A1 IMMERSION EXPOSURE TOOL Public/Granted day:2022-07-28
Information query
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