Invention Grant
- Patent Title: Cr—Si sintered body
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Application No.: US17295191Application Date: 2019-11-18
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Publication No.: US11967493B2Publication Date: 2024-04-23
- Inventor: Hiroyuki Hara , Hideto Kuramochi , Kenichi Itoh
- Applicant: TOSOH CORPORATION
- Applicant Address: JP Shunan
- Assignee: TOSOH CORPORATION
- Current Assignee: TOSOH CORPORATION
- Current Assignee Address: JP Shunan
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 18218832 2018.11.22 JP 19108661 2019.06.11
- International Application: PCT/JP2019/045113 2019.11.18
- International Announcement: WO2020/105591A 2020.05.28
- Date entered country: 2021-05-19
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C04B35/58 ; C23C14/06 ; C23C14/34

Abstract:
It is difficult for a Cr—Si-based sintered body composed of chromium silicide (CrSi2) and silicon (Si) to have high strength.
Provided is a Cr—Si-based sintered body including Cr (chromium) and silicon (Si), in which the crystal structure attributed by X-ray diffraction is composed of chromium silicide (CrSi2) and silicon (Si), a CrSi2 phase is present at 60 wt % or more in a bulk, a density of the sintered body is 95% or more, and an average grain size of the CrSi2 phase is 60 μm or less.
Provided is a Cr—Si-based sintered body including Cr (chromium) and silicon (Si), in which the crystal structure attributed by X-ray diffraction is composed of chromium silicide (CrSi2) and silicon (Si), a CrSi2 phase is present at 60 wt % or more in a bulk, a density of the sintered body is 95% or more, and an average grain size of the CrSi2 phase is 60 μm or less.
Public/Granted literature
- US20220017424A1 CR-SI SINTERED BODY Public/Granted day:2022-01-20
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