- Patent Title: Silicon carbide power diode device and fabrication method thereof
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Application No.: US17828782Application Date: 2022-05-31
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Publication No.: US11967651B2Publication Date: 2024-04-23
- Inventor: Yonghong Tao , Zhidong Lin , Zhigao Peng
- Applicant: Hunan Sanan Semiconductor Co., Ltd.
- Applicant Address: CN Hunan
- Assignee: XIAMEN SANAN INTEGRATED CIRCUIT CO., LTD.
- Current Assignee: XIAMEN SANAN INTEGRATED CIRCUIT CO., LTD.
- Current Assignee Address: CN
- Agency: Stetina Brunda Garred & Garred
- Priority: CN 2010626793.3 2020.07.01 CN 2010626798.6 2020.07.01 CN 2021269885.2 2020.07.01
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/16 ; H01L29/45 ; H01L29/66

Abstract:
A silicon carbide power diode device has a silicon carbide substrate on which a silicon carbide epitaxial layer with an active region is provided. A Schottky metal layer is on the active region, and a first electrode layer is on the Schottky metal layer. A first ohmic contact is on the silicon carbide substrate, and a second electrode layer is on the first ohmic contact. The active region of the silicon carbide epitaxial layer has a plurality of first P-type regions, a plurality of second P-type regions, and N-type regions. The first P-type regions and the second P-type regions lacking an ohmic contact are spaced apart with dimensions of the second P-type regions being minimized and the N-type regions being maximized for given dimensions of the first P-type region. Second ohmic contacts are located between the first P-type region and the Schottky metal layer.
Public/Granted literature
- US20220293800A1 SILICON CARBIDE POWER DIODE DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2022-09-15
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