Invention Grant
- Patent Title: Semiconductor wafer, radiation detection element, radiation detector, and production method for compound semiconductor monocrystalline substrate
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Application No.: US17439207Application Date: 2019-12-05
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Publication No.: US11967659B2Publication Date: 2024-04-23
- Inventor: Koji Murakami , Akira Noda , Ryuichi Hirano
- Applicant: JX METALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JX METALS CORPORATION
- Current Assignee: JX METALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 19094049 2019.05.17
- International Application: PCT/JP2019/047671 2019.12.05
- International Announcement: WO2020/235123A 2020.11.26
- Date entered country: 2021-09-14
- Main IPC: H01L31/0296
- IPC: H01L31/0296 ; H01L27/146 ; H01L31/08 ; H01L31/18 ; C30B29/48

Abstract:
Provided is a stable CdZnTe monocrystalline substrate having a small leakage current even when a high voltage is applied and having a lower variation in resistivity with respect to variations in applied voltage values. A semiconductor wafer comprising a cadmium zinc telluride monocrystal having a zinc concentration of 4.0 at % or more and 6.5 at % or less and a chlorine concentration of 0.1 ppm by mass or more and 5.0 ppm by mass or less, wherein the semiconductor wafer has a resistivity of 1.0×107 Ωcm or more and 1.0×108 Ωcm or less when a voltage of 900 V is applied, and wherein a ratio (variation ratio) of the resistivity at application of 0 V to the resistivity at application of a voltage of 900 V is 20% or less.
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