Invention Grant
- Patent Title: Systems and methods for automatic exposure control
-
Application No.: US17643834Application Date: 2021-12-12
-
Publication No.: US11968459B2Publication Date: 2024-04-23
- Inventor: Peng Zhu , Xingjian Zheng , Guangxiu Yao , Wei Fang , Yinchang Yang
- Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Applicant Address: CN Zhejiang
- Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Current Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Hangzhou
- Agency: METIS IP LLC
- Priority: CN 1910517324.5 2019.06.14
- Main IPC: H04N23/73
- IPC: H04N23/73 ; G06T7/00 ; H04N23/71

Abstract:
The present disclosure relates to systems and methods for automatic exposure control. The methods may include obtaining a first frame and a second frame of a current scene from a camera, wherein a ratio of a first exposure time of the first frame to a second exposure time of the second frame is a first exposure ratio; obtaining a first average luminance of a brightest region in the second frame; obtaining a second average luminance of a darkest region in the first frame; and determining a dynamic range of the current scene based on the first exposure ratio, the first average luminance, and the second average luminance.
Public/Granted literature
- US20220103740A1 SYSTEMS AND METHODS FOR AUTOMATIC EXPOSURE CONTROL Public/Granted day:2022-03-31
Information query