Invention Grant
- Patent Title: Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite prepared therefrom
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Application No.: US17207501Application Date: 2021-03-19
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Publication No.: US11977329B2Publication Date: 2024-05-07
- Inventor: Shang Hyeun Park , Hojeong Paek , Eun Joo Jang , Shin Ae Jun
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , SAMSUNG SDI CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO, LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO, LTD.
- Current Assignee Address: KR Gyeonggi-do; KR Gyeonggi-do
- Agency: CANTOR COLBURN LLP
- Priority: KR 20150118208 2015.08.21
- The original application number of the division: US15241224 2016.08.19
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C08F220/14 ; C09D4/06 ; C09K11/02 ; C09K11/70 ; G02B5/20 ; G02B5/22 ; G03F7/004 ; G03F7/033 ; B82Y30/00 ; B82Y40/00

Abstract:
A photosensitive composition including a quantum dot dispersion, a reactive compound having at least two thiol groups, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes a carboxylic acid group-containing polymer and a quantum dot dispersed in the carboxylic acid group containing polymer, and wherein the carboxylic acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic moiety and not having a carboxylic acid group.
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