Invention Grant
- Patent Title: Semiconductor manufacturing apparatus
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Application No.: US17462839Application Date: 2021-08-31
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Publication No.: US11978717B2Publication Date: 2024-05-07
- Inventor: Yuuki Kuro
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 21040446 2021.03.12
- Main IPC: B32B41/00
- IPC: B32B41/00 ; H01L23/00

Abstract:
A semiconductor manufacturing apparatus includes a stage capable of holding thereon an interconnection substrate. A tool presses the interconnection substrate and a semiconductor chip against each other between the tool and the stage. The tool includes a main body portion that has a holding surface holding thereon the semiconductor chip. A first protruding portion is provided along an outer edge of the holding surface and protrudes from the holding surface toward the stage. A second protruding portion is provided outside of the first protruding portion along the outer edge of the holding surface and protrudes from the holding surface toward the stage. A groove portion is provided between the first protruding portion and the second protruding portion.
Public/Granted literature
- US20220293551A1 SEMICONDUCTOR MANUFACTURING APPARATUS Public/Granted day:2022-09-15
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